EMS TURBO SPUTTER PDF

These products are for Research Use Only. Log files include date, time and process parameters. Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process. System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.

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These products are for Research Use Only. Log files include date, time and process parameters. Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process.

System prompts user to confirm target material and it then automatically selects appropriate parameters for that material. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data.

For convenience a number of typical sputtering and carbon coating profiles are already stored but also allows the user to create their own. Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating. Controlled ramped carbon rod evaporation Careful evaporation allows precise control of carbon thickness with or without the optional film thickness monitor.

The quality of the resulting carbon films is also enhanced by the eradication of "sparking" that is a common feature of less advanced coaters. For reproducible high-quality carbon films, we would recommend the use of shaped carbon rods. Rods are higher purity, less susceptible to debris and easier to control. Pulsed and ramped carbon rod recipes are supplied as standard. Cool Magnetron Sputtering Sputter coating is a technique widely used in various applications; it is possible to create a plasma and sputter metals with high voltage, poor vacuum and no automation.

However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts with the sample. The QT Plus series uses low temperature enhanced-plasma magnetrons optimized for the rotary pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

Others are available on request. Interchangeable plug-in heads This allows the user to configure the system as a sputter coater, evaporator or glow discharge system — all in one space saving format. A carbon cord evaporation insert is available as an option. Automatic detection of the head type when changed. Detachable chamber with built-in implosion guard Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.

Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples. Tall chamber option is available for carbon evaporation to avoid sample heating, improved uniformity for sputtering and to hold taller samples. Multiple stage options The QT Plus has specimen stages to meet most requirements. All are easy-change, drop-in style no screws and are height adjustable except for the rotary planetary stage.

Height can be pre-set. Tilt and height can be pre-set. Variable angle, rotary planetary stage for heavily contoured samples. Rotation stage for glass microscope slides. Other options are available on request. Safety The QT Plus meets key industry CE standards All electronic components are protected by covers Implosion guard prevents user injury in event of chamber failure Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened Electrical interlocks remove power when source head cover opened Overheating protection shuts down power supply Specifications mm W x mm D x mm H Total height with coating head open is mm Weight Includes features such as a log of the last coatings and reminders for when maintenance is due.

Other stages available on request. Hydraulically-formed bellows stainless-steel backing line. A wide range guage is available as an option.

Ultimate Vacuum 5 x mbar Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas. Sputter vacuum range Between 5 x and 5 x mbar Processes Sputtering Sputter current mA to a predetermined thickness with optional FTM or by the built-in timer.

Thermal evaporation of metals from filaments or boats. For cleaning TEM apertures, a standard molybdenum boat supplied can be fitted. Visual status indicator A large multi-color status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.

The indicator LED shows the following states: Initialization.

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Douran For cleaning TEM apertures, a standard molybdenum boat supplied can be fitted. Automatic vacuum control which can be pre-programmed to suit the process and tturbo, therefore removing the need for manual intervention or control. Other stages available on request. Includes manual rod shaper and 3.

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EMS TURBO SPUTTER PDF

Araran Supplied with carbon rods C 3. Full range, active vacuum gauge capable of measurement over the range of mbar to 5 x 10 -9 mbar. Typically ultimate vacuums of around 5 x 10 -5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas. When used with the extended height cylinder optional accessory the target to stage height would be an additional 87 mm. Please tick if you would like to subscribe to our newsletter. Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. Variable tilt angle, rotary planetary specimen stage, 50mm diameter rotational speed rpm.

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View more videos The QT D Plus is Suitable for multi-layer sequential sputtering of two materials, the QT D Plus has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum. The system is fully automated with user defined recipes controlling the pumping sequence, time, number of sputter cycles, and the current used during the process. Unlimited layers of varying thickness from two target materials can be sputtered sequentially by cycling between both targets. When not in use the targets are shuttered for protection from contamination. Substrates can be coated using non-oxidizing noble metals such as gold Au and platinum Pt. For coatings with a fine grain structure iridium Ir can also be used.

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